Method for producing a hard mask in a capacitor device and a hard mask for use in a capacitor device

A method for producing a hard mask and a hard mask for use in a capacitor device comprises the steps of applying a photosensitive sol-gel layer to the capacitor device, applying a pattern to the sol-gel layer to form a patterned layer and applying a thermal decomposition treatment to the patterned l...

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Bibliographic Details
Main Author ZHUANG HAOREN
Format Patent
LanguageEnglish
Published 27.07.2005
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CAPACITORS
CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES ORLIGHT-SENSITIVE DEVICES, OF THE ELECTROLYTIC TYPE
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A method for producing a hard mask and a hard mask for use in a capacitor device comprises the steps of applying a photosensitive sol-gel layer to the capacitor device, applying a pattern to the sol-gel layer to form a patterned layer and applying a thermal decomposition treatment to the patterned layer to convert it to a hard mask layer.
Bibliography:Application Number: CN200410100749