Method for forming pattern on semiconductor wafer using decay phase shift reflecting mask

• Main Authors: HUANG RONG FONG, BURDON JEREMY W
• Format: Patent
• Language: English
• Published: 16.03.2005
• Edition: 7
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMISTRY; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; LIME, MAGNESIA; METALLURGY; PERFORMING OPERATIONS; REFRACTORIES; SLAG; TRANSPORTING; TREATMENT OF NATURAL STONE