Nano-silicon dioxide used for nanometer standard granule

The invention discloses a nano-silicon dioxide used for nanometer standard granule, which is prepared from at least one deposition reaction between reactive silicic acid solution and sodium-hydroxide aqueous solution at pH=9-13, at a reaction temperature of 80-100 deg. C. Compared with the prior art...

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Bibliographic Details
Main Authors MINBO LAN, LEDE MIAO, HUIHUI YUAN
Format Patent
LanguageEnglish
Published 16.03.2005
Edition7
Subjects
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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Summary:The invention discloses a nano-silicon dioxide used for nanometer standard granule, which is prepared from at least one deposition reaction between reactive silicic acid solution and sodium-hydroxide aqueous solution at pH=9-13, at a reaction temperature of 80-100 deg. C. Compared with the prior art nano standard particles, the nano silicon oxide prepared through the present invention has high stability.
Bibliography:Application Number: CN2004125419