Method for producing optical recording disk

• Main Authors: KIM IN-SOOK, JEONG SOO-HWAN, YOO IN-KYEONG
• Format: Patent
• Language: Chinese; English
• Published: 02.06.2004
• Edition: 7
• Subjects: APPARATUS THEREFOR; CHEMISTRY; ELECTROFORMING; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; PERFORMING OPERATIONS; PHYSICS; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS; TRANSPORTING

提供具有相变材料膜的光记录介质和制备光记录介质的方法。在该方法中，首先在基材上顺序堆叠相变材料膜、牺牲膜和金属膜。然后，将金属膜阳极化形成具有多孔空穴的金属氧化物膜，并将经空穴暴露的牺牲薄膜部分阳极化形成氧化膜，然后，通过除去金属氧化物膜并通过刻蚀牺牲膜和使用牺牲膜的氧化物膜作为掩模的相变材料膜，使相变材料膜形成图案。然后，自牺牲膜除去氧化膜，并在图案化的相变材料膜上沉积上绝缘膜、反射膜和保护膜。该光记录介质通过所用自对准方法简单制造，并可具有高集成大容量记忆。 An optical recording medium having a phase transition material film and a method of manufacturing the optical recording medium are provided. In the method, first, a phase transition material film, a sacrificial film, and a metal film are sequentially stacked on a substrate. Next, the metal film is anodized to form a metal oxide film having a plurality of holes, and portions of the sacrificial film exposed through the holes are anode-oxidized to form oxide films. Thereafter, the phase transition material film is patterned by removing the metal oxide film and by etching the sacrificial film and the phase transition material film using the oxide films as a mask. Then, the oxide films are removed from the sacrificial film, and an upper insulation film, a reflection film, and a protection film are deposited on the upper surface of the patterned phase transition material film. The optical recording medium can be simply manufactured by using a self-alignment method and can have a highly-integrated large-capacity memory.