Concaved stack capacitor and its contacted plug and their producing method

• Main Authors: BORU XU, MINGCHONG JIANG, CONGMING ZHU
• Format: Patent
• Language: English
• Published: 06.11.2002
• Edition: 7
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The present invention provides a method to make a depressed stack capacitance and its contact plug, and the method includes the following preparing steps: first providing a substrate having a first insulation layer on its surface, them forming a etching stopage layer on the first insulation layer, forming at least one contact hole by etching the etching stopage layer and the first insulation layer. A conductive layer and a barrier layer are deposited in the contact hole in squence to fully fill the contact hole. A second insulation layer is formed on the etching stopage layer and the barrier layer. The second insulation layer is etched to form a concave hole with its hole depth at least down to the concave hole surface of etching stopage layer and barrier layer. A lower electrode layer isformed at the bottom and internal edge of the concave hole.