Dielectric/barrier rib composition for plasma display panel and manufacturing method thereof

Provided is a dielectric/barrier rib composition for a plasma display panel, comprising a compound 1 of the formula or at least one compound belonging to a polyhedral oligosilsesquioxane (compound 2) having R6SiO1.5 as a repeating unit, or comprising inorganic/organic hybrid materials having compoun...

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Bibliographic Details
Main Author BAE BYEONG-SOO,LEE TAE-HO,EO YOUNG-JOO,KIM JUNG-HWAN
Format Patent
LanguageEnglish
Published 11.07.2007
Subjects
ADHESIVES
BASIC ELECTRIC ELEMENTS
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
COMPOSITIONS BASED THEREON
CORRECTING FLUIDS
DYES
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
FILLING PASTES
GLASS
INKS
JOINING GLASS TO GLASS OR OTHER MATERIALS
METALLURGY
MINERAL OR SLAG WOOL
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
ORGANIC MACROMOLECULAR COMPOUNDS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
POLISHES
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
THEIR PREPARATION OR CHEMICAL WORKING-UP
USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:Provided is a dielectric/barrier rib composition for a plasma display panel, comprising a compound 1 of the formula or at least one compound belonging to a polyhedral oligosilsesquioxane (compound 2) having R6SiO1.5 as a repeating unit, or comprising inorganic/organic hybrid materials having compounds 1 and 2 as a monomer, wherein X is an integer inclusive 0, R1, R2, R3, R4, R5 and R6 are independently a linear, branched or cyclic C1-C12 hydrocarbon group containing one or more alkyl, alkoxy, ketone, acryl, methacryl, allyl, aromatic, halogen, amino, mercapto, ether, ester, sulfone, nitro, hydroxyl, cyclobutene, carbonyl, carboxyl, alkyd, urethane, vinyl, nitrile, hydrogen, or epoxy functional group, and A is oxygen or NH. The inorganic/organic hybrid materials can be a material composed of an extended matrix, containing silicon and oxygen or nitrogen atoms, and having at least one silicon fraction directly bonded to a substituted or unsubstituted hydrocarbon atom.
Bibliography:Application Number: CN200510056725