Process for preparation of optical element, electrolytic solution used for the same and apparatus for preparation of optical element

Disclosed herein are a process for easily preparing an optical element in a form of thin film which contains a functional material whose concentration changes gradationally in an in-plane direction and a thickness direction of a thin film, an electrolytic solution used for the process, and an appara...

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Bibliographic Details
Main Author SHIMIZU KEIJI,OTSU SHIGEMI,TANIDA KAZUTOSHI
Format Patent
LanguageEnglish
Published 07.02.2007
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Summary:Disclosed herein are a process for easily preparing an optical element in a form of thin film which contains a functional material whose concentration changes gradationally in an in-plane direction and a thickness direction of a thin film, an electrolytic solution used for the process, and an apparatus for preparing an optical element. The process is designed to form an optical element on an optical element preparing substrate from an electrolytic solution containing a functional material by electrodeposition or photovoltaic electrodeposition. The process includes a step of changing concentration of the functional material in the electrolytic solution in the vicinity of the optical element preparing substrate, so that a resulting thin film changes gradationally in the concentration of the functional material in the in-plane direction and/or the thickness direction of the thin film.
Bibliography:Application Number: CN20031009377