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Summary:An ultraviolet-curable resin composition comprises a phosphorus atom-containing photopolymerizable compound and a carboxyl group-containing photopolymerizable compound and exhibits the surface tension at 25 DEG C in the range of 30 to 50 mN/m. Preferably the composition comprises (a) a compound having one or more (meth)acryloyl groups in its molecule and a phosphorus atom, (b) a compound having one carboxyl group and one (meth)acryloyl group in its molecule, (c) a compound having one or more (meth)acryloyl groups in its molecule, (d) a leveling agent, and (e) a photoinitiator. The ultraviolet-curable resin composition is useful as a protective material for etching, particularly as a back-coating material in the production of a shadow mask.
Bibliography:Application Number: CN20008003226