Abstract An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 kOmegam or less.
AbstractList An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of Ti/In is 0.003 to 0.120, and the specific resistance is 1 kOmegam or less.
Author ABE YOSHIYUKI,ISHIYAMA NORIKO,OHARA TAKESHI
Author_xml – fullname: ABE YOSHIYUKI,ISHIYAMA NORIKO,OHARA TAKESHI
BookMark eNqNjD0KAjEUBlNo4d8d3gFU1BXBOihW2tgvMfl2CawvIXkrenvD4gGsBoZhpmrEgTFRcnt7B8qeBQmOHsF9yLCjHHspynNLYlILWQ46JkReFwSLnCk0JMlwjiaBhWxg11vxL1AYvo3vntTnMjaZ0MFKCg5zNW5Ml7H4cabofLrrywox1CgzC4bU-rrd7avDcaN19UfyBWz4RlA
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
ExternalDocumentID CN1243690CC
GroupedDBID EVB
ID FETCH-epo_espacenet_CN1243690CC3
IEDL.DBID EVB
IngestDate Fri Jul 19 15:08:06 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_CN1243690CC3
Notes Application Number: CN200310120357
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060301&DB=EPODOC&CC=CN&NR=1243690C
ParticipantIDs epo_espacenet_CN1243690CC
PublicationCentury 2000
PublicationDate 20060301
PublicationDateYYYYMMDD 2006-03-01
PublicationDate_xml – month: 03
  year: 2006
  text: 20060301
  day: 01
PublicationDecade 2000
PublicationYear 2006
RelatedCompanies SUMITOMO METAL MINING CO., LTD
RelatedCompanies_xml – name: SUMITOMO METAL MINING CO., LTD
Score 2.6430755
Snippet An oxide sintered body for sputtering target is provided wherein the main component is indium oxide, and it contains titanium such that the atomic ratio of...
SourceID epo
SourceType Open Access Repository
SubjectTerms ARTIFICIAL STONE
BASIC ELECTRIC ELEMENTS
CABLES
CEMENTS
CERAMICS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS
CONCRETE
CONDUCTORS
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRICITY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
INSULATORS
LIME, MAGNESIA
METALLURGY
REFRACTORIES
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SLAG
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TREATMENT OF NATURAL STONE
Title Oxide sintered body and sputtering target, and prepn. process of transparent conductive oxide film used as electrode
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060301&DB=EPODOC&locale=&CC=CN&NR=1243690C
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5qFfWmVbG-mIPkZDTQvDwEoZuWIjQtUqW3sml2saBJaLao_97Z7UMvegsbGHYXZr_9ZuebAbiWInRSIse2f-_6tpZ22qFHrDWTXKRe5hEm63hHP_F7z-7j2BvX4HWthTF1Qj9McUTyqCn5uzLndfkTxIpNbmV1l85oqHjojqLY2rBjfcO34nbUGQ7iAbMYi1hiJU8RwViLiCDbgm26RAfaFzovba1JKX8DSvcAdoZkK1eHUBN5A_bYuu9aA3b7q-du-lx5XnUEavBJ08VKl3eYiwzTIvtCnmdYlabVNCEQLrO6b8xwORdlfovlUgeAhURlyphr7ZdCIsG6ziuddFgYu3L29o6LigzzCletcTJxDNjtjFjPpulPNjs1Ycl6nax1AvW8yMUpIPel64eeCKaBdKV0Uv3y7nCZOpKHTsCb0PzTzNk__85hfxmQ0BlZF1BX84W4JIhW6ZXZ3W9eXpig
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_mFOebTsX5mQfpk9XC-uVDEZZuTN26IVP2NtI1wYG2pc1Q_3sv2Ye-6FtJ4UgCl19-l_vdAVwK7lsxkmPTvbVdU0k7Td9B1poIxmMncRCTVbyjH7ndZ_th7Iwr8LrSwug6oR-6OCJ61BT9XerzOv8JYoU6t7K8iWc4lN11RkForNmxuuEbYStoDwfhgBqUBjQyoqcAYayJRJBuwCZesD3lC-2XltKk5L8BpbMLW0O0lco9qPC0DjW66rtWh-3-8rkbP5eeV-6DHHzidEmpyjsUPCFxlnwRliakzHWraUQgssjqvtLDecHz9JrkCx0AyQSRuoy50n5JgiRY1XnFk45k2q6Yvb2TeYmGWUmWrXESfgCk0x7RronTn6x3akKj1Tpp8xCqaZbyIyDMFbbrO9ybesIWworVy7vFRGwJ5lsea0DjTzPH__y7gFp31O9NevfR4wnsLIITKjvrFKqymPMzhGsZn-ud_ga0U5uT
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Oxide+sintered+body+and+sputtering+target%2C+and+prepn.+process+of+transparent+conductive+oxide+film+used+as+electrode&rft.inventor=ABE+YOSHIYUKI%2CISHIYAMA+NORIKO%2COHARA+TAKESHI&rft.date=2006-03-01&rft.externalDBID=C&rft.externalDocID=CN1243690CC