Partial oxidizing modifying device

Hydrogen-rich reformed gas is produced by reaction including partial oxidation of feed gas in a reforming reaction section (6). In this case, for the purpose of reducing temperature variations in the reforming reaction section (6), improving the thermal efficiency thereof and providing a reformer (A...

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Bibliographic Details
Main Authors OKAMOTO YASUYOSHI, IKEGAMI SHUJI, MATSUI NOBUKI
Format Patent
LanguageEnglish
Published 21.09.2005
Edition7
Subjects
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Summary:Hydrogen-rich reformed gas is produced by reaction including partial oxidation of feed gas in a reforming reaction section (6). In this case, for the purpose of reducing temperature variations in the reforming reaction section (6), improving the thermal efficiency thereof and providing a reformer (A) with a simple and compact construction, the reformer (A) is formed in a double-wall structure consisting of a housing (1) and partitions (2), (2) inside of the housing (1), the reforming reaction section (6) is contained between the partitions (2), (2), and a feed gas passage (3) is provided by the space between the housing (1) and the partition (2). In this manner, the feed gas passage (3) is provided in the surrounding area of the reforming reaction section (6). The reforming reaction section (6) is thermally insulated by the feed gas passage (3) so that temperature variations in the reforming reaction section (6) can be reduced. The feed gas in the feed gas passage (3) is preheated by heat of reaction in the reforming reaction section (6) so that the self-recovery of heat can improve thermal efficiency of the reformer (A). In addition, a preheater for preheating the feed gas can be formed integrally between the feed gas passage (3) and the reforming reaction section (6) thereby compacting the construction of the reformer.
Bibliography:Application Number: CN20008004334