Photosensitive resin composition and method for forming Liquid crystal display inter layer insulation layer pattern

• Main Authors: JUNG MOON PARK, KI-BUM PAIK
• Format: Patent
• Language: English
• Published: 09.02.2005
• Edition: 7
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTROGRAPHY; FREQUENCY-CHANGING; HOLOGRAPHY; MATERIALS THEREFOR; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE: A photosensitive resin constituent based upon siloxane is provided to bring a usefulness to form an insulating layer or a protection layer in fabrication of a liquid crystal display element and a semiconductor device. CONSTITUTION: The constituent for fabricating a thin film liquid crystal display is composed of a siloxane-series polymer binder, a polyphenol-series auxiliary binder one selected from a group consisting polyhydroxistilene and polystilene-hydroxistilene, a light acid-forming agent, and a cross-link agent, wherein the light acid-forming agent is composed of one selected from a group consisting of triphenylsulfonium salt, diphenyliodine salt, and halogen compound of a triazine derivative.