Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern

• Main Authors: MATSUO HIROKI, NISHIMOTO HIDEAKI, UNO DAISUKE, SAKURAI TAKAAKI
• Format: Patent
• Language: Chinese; English
• Published: 23.08.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; CINEMATOGRAPHY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; PRINTED CIRCUITS

Provided is a photosensitive resin composition in which various characteristics can be improved by controlling the type and ratio of at least an acid comonomer component among the comonomer components of an alkali-soluble polymer. The photosensitive resin composition contains the following components: (A) an alkali-soluble polymer, (B) a compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator. Component (A) has at least a structural unit derived from the following comonomer components: (a) methacrylic acid or acrylic acid, (b) a carboxylic acid different from the acid selected as component (a), and (c) a compound having an aromatic structure or an alicyclic structure. In component (A), the ratio (mass ratio (a1)/mass ratio (b1)) of the mass ratio (a1) of the structural units derived from component (a) to the mass ratio (b1) of the structural units derived from component (b) is 1/10-10. 本发明提供一种感光性树脂组合物，其中，在碱溶性高分子的共聚单体成分中，至少控制酸共聚单体成分的种类及比率，能够实现各种特性的提高。感光性树脂组合物含有以下成分：(A)碱溶性高分子、