Temperature stabilization of climate chambers

• Main Authors: KORTELAINEN, RAMI, JONSSON, FREDRIK
• Format: Patent
• Language: Chinese; English
• Published: 20.08.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A microlithography system (100) comprising: a climate chamber (110) enclosing an atmosphere; a printing device (120) for projecting a light beam onto the photosensitive resist, the printing device being arranged in the climate chamber; a fluid reservoir (130) arranged to contain a thermally conductive fluid and arranged to be thermally connected with the atmosphere to transfer heat between the atmosphere and the thermally conductive fluid; a first heat exchange device (140) arranged outside the climate chamber; means (150) for conveying the heat transfer fluid between the fluid reservoir and the first heat exchange means; and means (160) for supplying gas from outside the climate chamber to the closed atmosphere; wherein the first heat exchange device is configured to transfer heat between the thermally conductive fluid and the gas before the gas is supplied to the closed atmosphere. 一种微光刻系统(100)，包括：气候室(110)，其封闭气氛；打印设备(120)，用于将光束投射到光敏抗蚀剂上，打印设备布置在气候室中；流体储存器(130)，流体储存器被布置成容纳导热流体并且被布置成与所述气氛热连接以在所述气氛与所述导热流体之间传递热量