Micro-channel plate with low resistance temperature coefficient and high stability and preparation method thereof

The invention provides a microchannel plate with low resistance temperature coefficient and high stability and a preparation method thereof, and the method is characterized in that a resistance layer and an emission layer are prepared on a completely insulated micropore array substrate by using an a...

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Main Authors SUN SAILIN, QIU XIANGBIAO, WANG JIAN, XU ZHAO, LIU DAN, YANG XIAOMING, TANG SICHEN, ZHANG HUAN, MIN, SHIN KUL, CONG XIAOQING
Format Patent
LanguageChinese
English
Published 20.08.2024
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Summary:The invention provides a microchannel plate with low resistance temperature coefficient and high stability and a preparation method thereof, and the method is characterized in that a resistance layer and an emission layer are prepared on a completely insulated micropore array substrate by using an atomic layer deposition technology, so that the resistance layer and the emission layer have electron multiplication capability, and the microchannel plate is formed. The resistance layer adopts a platinum-doped aluminum oxide composite film layer, and through water and ozone treatment in a film layer preparation cycle process, the density of hydroxyl is improved, the chemical adsorption of a metal source is enhanced, high-density metal nanoparticles are realized, the high controllability of the resistance layer is realized, and the composite film layer with a low resistance temperature coefficient is manufactured; the micro-channel plate with low resistance temperature coefficient and high stability is realized, an
Bibliography:Application Number: CN202410455843