Alignment sensor, lithographic apparatus, semiconductor device, and electronic apparatus

• Main Author: KIM JAESIK
• Format: Patent
• Language: Chinese; English
• Published: 09.08.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention provides an alignment sensor, a lithographic apparatus, a semiconductor device, and an electronic apparatus. The alignment sensor comprises an irradiation system, wherein the irradiation system is configured to emit laser with linearly adjustable wavelength in a preset range to an alignment mark on a wafer. In the alignment sensor, the irradiation system does not adopt laser with a fixed wavelength value any more, but can emit laser with linearly adjustable wavelength in the preset range, so that the optimal wafer alignment wavelength can be found during wafer alignment, and the wafer alignment precision is improved. And when alignment fails, the laser wavelength can be adjusted for re-alignment, so that rework can be reduced, and the production efficiency is improved. 本公开提供一种对准传感器、光刻设备、半导体器件及电子设备。该对准传感器包括：照射系统，所述照射系统被配置为向晶圆上的对准标识发射在预设范围内波长线性可调的激光。本申请的对准传感器中，照射系统不再采用固定波长值的激光，而是可以发射在预设范围内波长线性可调的激光，从而能够在进行晶圆对准时找到最佳的晶圆对准波长，从而提高晶圆对准精度。在出现对准失败时，可以调节激光波长而重新对准，可减少返工，从而提高了生产效率。