Polyacid oxygen cluster-based semiconductor material, preparation method thereof and application of polyacid oxygen cluster-based semiconductor material in field of radiation detection
The invention discloses a polyacid oxygen cluster-based semiconductor material. The molecular formula of the polyacid oxygen cluster-based semiconductor material is [M3 (I) (P) (DTB) 3] n, wherein n is infinity and represents continuous repeated infinite extension; m is selected from one of Cu <...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
30.07.2024
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a polyacid oxygen cluster-based semiconductor material. The molecular formula of the polyacid oxygen cluster-based semiconductor material is [M3 (I) (P) (DTB) 3] n, wherein n is infinity and represents continuous repeated infinite extension; m is selected from one of Cu < + > and Ag < + >; p is-3 valence phosphomolybdic acid or phosphotungstic acid after complete dehydrogenation; and DTB is 1H-1, 2, 4-triazole or 1, 1-bis (1, 4-phenylene). The polyacid oxygen cluster-based semiconductor material provided by the invention is simple in preparation method, has the characteristics of better X-ray attenuation capability, large carrier mobility and life product value and high X-ray detection sensitivity, and has application value in the fields of direct X-ray radiation detection, radiation detection dosimeters, X-ray semiconductor medical imaging and the like.
本申请公开了一种多酸氧簇基半导体材料,所述多酸氧簇基半导体材料的分子式为:[M3(I)(P)(DTB)3]n;其中,n为∞,表示不断重复无限延伸;M选自Cu+、Ag+中的一种;P为-3价的完全脱氢后磷钼酸或磷钨酸;DTB为1H-1,2,4-三唑,1,1-双(1,4- |
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Bibliography: | Application Number: CN202311870499 |