Deposition of iodine-containing carbon films

• Main Authors: STAFFORD NATHAN, GUO XIANGYU, NGUYEN PHU, MARCHEGIANI, FABRIZIO
• Format: Patent
• Language: Chinese; English
• Published: 26.07.2024
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method for depositing an iodine-containing film on a substrate material comprises: exposing the substrate material to a vapor of a film-forming composition comprising an iodine-containing precursor having the formula CaHxIyFz wherein a = 1-10, xgt; 0, ygt; 1, zgt; 0, x + y + z = a, 2a or 2a + 2; with the proviso that when a = 1, x = 2 and z = 0, y is not equal to 2, and depositing the iodine-containing film formed from the iodine-containing precursor on the substrate material by a vapor deposition method. The method further comprises exposing the substrate material to a vapor of a co-reactant nitrogen-containing molecule having the general formula CxHyFzNHa, where x = 1-6, y = 0-13, z = 0-13 and a = 1-2, or CxHyFzN-R1, where x = 1-6, y = 0-13, z = 0-13, and R1 is a C1-C5 hydrocarbon. 一种用于在基底材料上沉积含碘膜的方法包括：将该基底材料暴露于成膜组合物的蒸气中，该成膜组合物包含具有式CaHxIyFz的含碘前体，其中a＝1-10，x>0，y>1，z>0，x+y+z＝a、2a或2a+2；前提是当a＝1，x＝2并且z＝0时，y不等于2，并且通过气相沉积法在该基底材料上沉积由该含碘前体形成的该含碘膜。该方法进一步包括将该基底材料暴露于共反应物含氮分子的蒸气中，该共反应物含氮分子具有通式CxHyFzNHa，其中x＝1-6，y＝0-13，z