Molybdenum compound, method for producing same, and composition for thin film deposition comprising same

• Main Authors: JEON SANG-YONG, KWON YONG-HEE, LEE SANG ICK, LIM YOUNG JAE, BYUN TAE-SEOK, LEE SANGAN
• Format: Patent
• Language: Chinese; English
• Published: 19.07.2024
• Subjects: ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; ORGANIC CHEMISTRY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The present invention relates to a molybdenum compound, a method for manufacturing the same, a composition for thin film deposition of a molybdenum-containing thin film comprising the same, and a method for manufacturing a molybdenum-containing thin film using the same, and a molybdenum-containing thin film having a uniform thickness can be manufactured at an improved deposition rate by using the molybdenum compound of the present invention having excellent thermal stability, high volatility, and improved vapor pressure. 本发明涉及钼化合物、其制造方法、包含其的含钼薄膜的薄膜沉积用组合物、利用其的含钼薄膜的制造方法，采用具有优异的热稳定性、高的挥发性和提高的蒸气压的本发明的钼化合物，可以以提高的沉积速度制造均匀厚度的含钼薄膜。