Structural parallelism measurement method and device, electronic equipment and storage medium

• Main Authors: ZHANG LITAO, HU XIAOZHEN, HAN SENYUAN, WANG QIUPING, YANG SEN, LIU XINGDONG, LI MIN, WU JIN, FAN HAIFENG, WANG LIREN, XU JIANWEI, GONG CHUNJIE, HUANG YONG, LU ZHONGYAN, LIN HENGQUAN, CHEN HANTANG
• Format: Patent
• Language: Chinese; English
• Published: 16.07.2024
• Subjects: MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PHYSICS; TESTING

The invention relates to the technical field of measurement, and provides a structure parallelism measurement method and device, electronic equipment and a storage medium, based on the measurement device, the method comprises the following steps: determining a first measurement position and a second measurement position according to an obtained target structure size; obtaining measurement values obtained by measuring a plurality of measurement points preset on the end face by the measuring instrument at the first measurement position and the second measurement position; obtaining a first end face model and a second end face model based on the measured values; and obtaining the parallelism of the target structure according to the first end face model and the second end face model. According to the invention, different measurement positions are set according to the size of each target structure, and the precision and universality of structure parallelism measurement are improved. The corresponding end face mode