Amorphous hydrogen storage high-entropy alloy film and preparation method and application thereof

• Main Authors: SUN YONGJU, CHEN ZHAORUI, LI GANG, YU JIE
• Format: Patent
• Language: Chinese; English
• Published: 12.07.2024
• Subjects: ALLOYS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOUNDS THEREOF; DIFFUSION TREATMENT OF METALLIC MATERIAL; FERROUS OR NON-FERROUS ALLOYS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INORGANIC CHEMISTRY; METALLURGY; NON-METALLIC ELEMENTS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF ALLOYS OR NON-FERROUS METALS

The invention discloses an amorphous hydrogen storage high-entropy alloy film and a preparation method and application thereof.The amorphous hydrogen storage high-entropy alloy film comprises a buffer layer, a hydrogen storage layer and an anti-oxidation protection layer, and the hydrogen storage layer contains titanium, zirconium, vanadium, niobium, hafnium and tantalum; wherein the molecular general formula of the hydrogen storage layer is Ti < a > Zr < b > V < c > Nb < d > H < feTafX < g >; x is selected from one or more than two of platinum, palladium, gold and silver; the atomic concentration of each element of the hydrogen storage layer is as follows: 15 < = a < = 35at%, 15 < = b < = 35at%, 5 < = c < = 25at%, 5 < = d < = 20at%, 0 lt; e < = 20 at%, 0 < = f < = 20 at%, 0 < = g < = 1 at%, and a + b + c + d + e + f + g = 100; the amorphous hydrogen storage high-entropy alloy film can absorb hydrogen at room temperature without activation under low pressure, and has the excellent properties of high hydrogen