ORGANOMETAL COMPOUND, RESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMING METHOD USING THE SAME

Provided are an organometallic compound represented by one of the following formulae 1-1 to 1-4, a resist composition including the same, and a pattern forming method using the same. The description of M11, L11-L14, a11-a14, R11-R14, X11-X14, n11-n15, Y11-Y13, and R15-R17 in Formulae 1-1 to 1-4 is s...

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Main Authors HAN SUNG-HYUN, KIM KYUNG-OH, KIM MI-JEONG, LEE JAE-JUN, HONG SUK-KOO, GAO XINGDE, LEE HASUP, KWAK YOONHYUN, IM KYU-HYUN
Format Patent
LanguageChinese
English
Published 28.06.2024
Subjects
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Provided are an organometallic compound represented by one of the following formulae 1-1 to 1-4, a resist composition including the same, and a pattern forming method using the same. The description of M11, L11-L14, a11-a14, R11-R14, X11-X14, n11-n15, Y11-Y13, and R15-R17 in Formulae 1-1 to 1-4 is shown in the description. # imgabs0 # 提供有机金属化合物、包括其的抗蚀剂组合物和使用其的图案形成方法，所述有机金属化合物由下式1-1至1-4之一表示。对于式1-1至1-4中的M11、L11-L14、a11-a14、R11-R14、X11-X14、n11-n15、Y11-Y13、和R15-R17的描述，参见说明书。#imgabs0#
Bibliography:Application Number: CN202311214564