Substrate processing apparatus and method

• Main Authors: YOO JAE-SEUNG, SONG KYOUNG-WON, AHN HEE-MAN, EOM SUNG-HOON
• Format: Patent
• Language: Chinese; English
• Published: 25.06.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

Disclosed are a substrate processing apparatus and method in which a surrounding humidity environment can be accurately controlled based on a photoresist for extreme ultraviolet light (EUV) applied on a substrate in a heat treatment process such as a baking process. The substrate processing apparatus includes: a housing having a processing space defined therein; a support unit for supporting the substrate accommodated in the processing space thereon; and a gas supply unit configured to alternately supply a first gas and a second gas into the processing space in response to a photoresist (PR) for extreme ultraviolet light (EUV) applied to the substrate. 公开了基板处理装置和方法，其中在诸如烘烤工艺的热处理工艺中，可以基于施加在基板上的用于极紫外光(EUV)的光刻胶来精确地控制周围的湿度环境。基板处理装置包括：壳体，具有限定在其中的处理空间；支承单元，用于在其上支承容纳在处理空间中的基板；以及气体供应单元，配置成响应于施加到基板上的用于极紫外光(EUV)的光刻胶(PR)而交替地将第一气体和第二气体供应到处理空间中。