Coated component of capacitive coupling chamber

• Main Authors: SONG YIWEI, WETZEL DAVID JOSEPH, LIU LEI, BRIGGS SCOTT, SRINIVASAN SATISH, KERNS JOHN MICHAEL, XU LIN, BAILEY III ANDREW D, KINSLER MICHAEL JULIUS, KIRSCHEY, ROBIN
• Format: Patent
• Language: Chinese; English
• Published: 18.06.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

An apparatus for processing a substrate is provided. A capacitively coupled plasma electrode is within the capacitively coupled plasma processing chamber. A plasma confinement member within the capacitively coupled plasma processing chamber wherein at least one of the capacitively coupled plasma electrode and the plasma confinement member includes: a metal member body having a plasma facing surface; and a plasma spray layer over the plasma facing surface. 提供了一种用于处理衬底的装置。电容耦合等离子体电极在电容耦合等离子体处理室内。等离子体约束部件在该电容耦合等离子体处理室内，其中该电容耦合等离子体电极和等离子体约束部件中的至少一者包含：金属部件主体，其具有面向等离子体的表面；以及等离子体喷涂层，其在该面向等离子体的表面的上方。