High-purity high-stability cascade arc plasma source
The invention discloses a high-purity and high-stability cascade arc plasma source which comprises a cascade piece, a cathode seat, a cathode air inlet bin arranged on the cathode seat and a plasma channel arranged on the cascade piece. A water cooling channel used for cooling the plasma channel is...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
18.06.2024
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Subjects | |
Online Access | Get full text |
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