All-dielectric metasurface for enhancing second harmonic effect

The invention belongs to the technical field of quantum light sources, and discloses an all-dielectric metasurface for enhancing the second harmonic effect, which comprises a substrate layer and a nonlinear material layer, the non-linear material layer is arranged on the surface of the substrate lay...

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Bibliographic Details
Main Authors FAN YUANCHENG, ZHANG FULI, SUN KANGYAO, YE ZHEHAO, QIU WEIXI
Format Patent
LanguageChinese
English
Published 18.06.2024
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Summary:The invention belongs to the technical field of quantum light sources, and discloses an all-dielectric metasurface for enhancing the second harmonic effect, which comprises a substrate layer and a nonlinear material layer, the non-linear material layer is arranged on the surface of the substrate layer, the non-linear material layer comprises a plurality of non-linear material column pairs, the plurality of non-linear material column pairs are periodically arranged to form a sub-wavelength lattice structure, and the degree of asymmetry of the non-linear material column pairs is adjustable. The device has the advantages of being efficient, miniature, high in damage threshold value and the like, the continuous domain bound state is regulated and controlled by regulating and controlling the structural asymmetry degree of the anisotropic nonlinear material column pair, and therefore the light-substance interaction of the nonlinear optical material layer on incident fundamental frequency light is enhanced, the peak
Bibliography:Application Number: CN202410463922