Preparation process of submicron spherical silicon dioxide

The invention relates to a preparation process of submicron spherical silicon dioxide. The method comprises the steps of gas mixing, gas combustion, raw material pretreatment, silicon dioxide preparation and particle collection, the submicron spherical silicon dioxide is prepared by creatively combi...

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Bibliographic Details
Main Authors QIU JIAHAO, HUO ZHANSHENG, CHEN CHEN, ZHENG YUECANG
Format Patent
LanguageChinese
English
Published 18.06.2024
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Summary:The invention relates to a preparation process of submicron spherical silicon dioxide. The method comprises the steps of gas mixing, gas combustion, raw material pretreatment, silicon dioxide preparation and particle collection, the submicron spherical silicon dioxide is prepared by creatively combining a gas-phase combustion method and taking silicon, silicon oxide and silicon nitride as raw materials, and the submicron spherical silicon dioxide has the advantages of small particle size, large specific surface area, high purity, high quality and the like. 本发明涉及一种亚微米级球形二氧化硅的制备工艺。它包括有气体混合、气体燃烧、原料预处理、二氧化硅的制备和颗粒收集步骤,本文创造性的结合气相燃烧法,以硅和氧化硅、氮化硅为原料,制备亚微米级球形二氧化硅,其具有小粒径、大比表面积、高纯度、高质量等优点。
Bibliography:Application Number: CN202410316651