CLEANING PORT FILTER SUPPORT

A front open wafer transfer cartridge includes a housing and a wash port in the housing. The wash port includes a filter membrane and a wash filter support. The cleaning filter support includes an outer ring structure and a support frame. The support frame extends from the outer ring structure. The...

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Bibliographic Details
Main Author EGGUM SHAWN D
Format Patent
LanguageChinese
English
Published 07.06.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:A front open wafer transfer cartridge includes a housing and a wash port in the housing. The wash port includes a filter membrane and a wash filter support. The cleaning filter support includes an outer ring structure and a support frame. The support frame extends from the outer ring structure. The outer ring structure includes a plurality of supports that provide a support surface for the filter membrane. A thickness of one or more of the supports increases from a thickness of the upper support surface, respectively. A wash filter support includes an outer ring structure and one or more openings, a support frame extending from the outer ring structure. The support frame includes a support providing a support surface configured to contact and support a filter membrane. A thickness of each of the one or more supports increases from a first thickness of the upper support surface. 一种前开式晶片传送盒包含外壳及所述外壳中的清洗端口。所述清洗端口包含滤膜及清洗过滤器支撑件。所述清洗过滤器支撑件包含外环结构及支撑框架工作。所述支撑框架从所述外环结构延伸。所述外环结构包含为所述滤膜提供支撑表面的多个支撑件。所述支撑件中的一或多者的厚度分别从上支撑表
Bibliography:Application Number: CN20228071662