Reflection type radiation refrigeration film for intelligent substation and preparation method of reflection type radiation refrigeration film

• Main Authors: CHANG YISHAN, WANG FAN, JIN CHAOJUN, YANG YONGHENG
• Format: Patent
• Language: Chinese; English
• Published: 31.05.2024
• Subjects: ADHESIVES; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMICAL PAINT OR INK REMOVERS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DIFFUSION TREATMENT OF METALLIC MATERIAL; DYES; FILLING PASTES; GENERAL PROCESSES OF COMPOUNDING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS; WORKING-UP

The invention relates to a reflection type radiation refrigeration film for an intelligent substation and a preparation method of the reflection type radiation refrigeration film. The reflection type radiation refrigeration film for the intelligent substation comprises a base material layer, a first reflection layer and a second reflection layer which are sequentially arranged. The first reflecting layer comprises a metal layer, a silicon dioxide lower interlayer, an optical high polymer layer and a silicon dioxide covering layer which are sequentially arranged, the metal layer is arranged on the base material layer, and the second reflecting layer is arranged on the silicon dioxide covering layer; the second reflecting layer is obtained by coating and drying a reflecting material coating, and the reflecting material coating comprises the following components in parts by weight: 2-4 parts of silicon dioxide microspheres, 3-5 parts of chromium dioxide microspheres, 3-5 parts of barium sulfate microspheres, 20-