SEM image alignment

A method of determining an offset between a plurality of datasets, each dataset representing a sampling region of a pattern formed on a sample, where each sampling region originates from a predetermined portion of a mask pattern, the method comprising: detecting a fingerprint of the mask pattern in...

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Bibliographic Details
Main Authors KOOYMAN MAARTEN, VAN BREE, JAN
Format Patent
LanguageChinese
English
Published 28.05.2024
Subjects
CALCULATING
COMPUTING
COUNTING
IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
PHYSICS
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Summary:A method of determining an offset between a plurality of datasets, each dataset representing a sampling region of a pattern formed on a sample, where each sampling region originates from a predetermined portion of a mask pattern, the method comprising: detecting a fingerprint of the mask pattern in noise of the dataset; and determining an offset based on the fingerprint of the mask pattern. 一种确定多个数据集之间的偏移的方法，每个数据集表示在样品上形成的图案的采样区域，其中每个采样区域源自掩模图案的预定部分，该方法包括：检测数据集的噪声中的掩模图案的指纹；以及基于掩模图案的指纹确定偏移。
Bibliography:Application Number: CN202280068234