Fluid extraction system, method and lithographic apparatus

• Main Authors: ROOS, WILLIAM, A, LINSON, BERNARDUS, P., J, FRENCKEN MARK JOHANNES HERMANUS, SMEETS, BART, C., H
• Format: Patent
• Language: Chinese; English
• Published: 24.05.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Disclosed herein is a fluid extraction system for a lithographic apparatus, the fluid extraction system configured to extract a fluid along a flow path, a fluid handling system comprising a fluid handling structure arranged to provide the fluid, the flow path comprising a gap between an edge of a substrate and an edge of a surrounding structure of the substrate; and a controller arranged to control the flow of the fluid in the flow path as a function of one or more of a property of the substrate, a property of the fluid handling system, a property of the fluid handling structure, a property of the fluid extraction system, and an interval between the fluid handling structure and the fluid extraction system. 本文中公开了一种用于光刻设备的流体提取系统，该流体提取系统被配置为沿着流动路径提取流体，包括流体处理结构的流体处理系统被布置为提供流体，该流动路径包括在衬底的边缘和所述衬底的围绕结构的边缘之间的间隙；以及控制器，该控制器被布置为根据衬底的性质、流体处理系统的性质、流体处理结构的性质、流体提取系统的性质以及流体处理结构和流体提取系统之间的间隔中的一项或多项控制流动路径中的流体的流量。