Method and device for measuring bandwidth increase

There is disclosed a method for measuring a measurement application (335; 340, 340; 345) for optimizing (300) the bandwidth of a measured illumination, and an associated metrology device. The method comprises: performing (305) a reference measurement with a reference measurement illumination having...

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Bibliographic Details
Main Authors MOSSAVAT SEYED IMAN, HINNEN PAUL CHRISTIAAN, CRAMER HUGO AUGUSTINUS JOSEPH
Format Patent
LanguageChinese
English
Published 24.05.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:There is disclosed a method for measuring a measurement application (335; 340, 340; 345) for optimizing (300) the bandwidth of a measured illumination, and an associated metrology device. The method comprises: performing (305) a reference measurement with a reference measurement illumination having a reference bandwidth; and performing (310; 325) one or more optimized measurements, each of the one or more optimized measurements being performed with a measurement illumination having a varying candidate bandwidth. Comparing (320) the one or more optimized measurements with a reference measurement; and selecting (330) an optimal bandwidth for the measurement application based on the comparison. 公开了一种针对测量应用(335；340；345)优化(300)测量照射的带宽的方法、以及一种相关联的量测装置。该方法包括：利用具有参考带宽的参考测量照射，执行(305)参考测量；以及执行(310；325)一个或多个优化测量，上述一个或多个优化测量中的每个优化测量是利用具有变化的候选带宽的测量照射来执行的。将一个或多个优化测量与参考测量进行比较(320)；并且基于比较，为测量应用选择(330)最佳带宽。
Bibliography:Application Number: CN202410180427