Method for producing high-purity germanium based on reduction of rotary CVD (Chemical Vapor Deposition) reactor

• Main Authors: CUI DINGFANG, KO KOHEI, CHEN FENGYANG, GOU QINGYI, WANG TONGBO, DING ZHIYING, HOU YANQING, KOU BIN, CHEN JUNXIAO
• Format: Patent
• Language: Chinese; English
• Published: 10.05.2024
• Subjects: CASTING; CHEMISTRY; FERROUS OR NON-FERROUS ALLOYS; MAKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; METALLURGY; PERFORMING OPERATIONS; POWDER METALLURGY; PRETREATMENT OF RAW MATERIALS; PRODUCTION AND REFINING OF METALS; TRANSPORTING; TREATMENT OF ALLOYS OR NON-FERROUS METALS; WORKING METALLIC POWDER

The invention relates to the technical field of germanium material preparation, and discloses a method for producing high-purity germanium by reduction based on a rotary CVD (chemical vapor deposition) reactor, which comprises the following steps: introducing germanium tetrachloride steam and hydrogen into a container from a gas inlet of the rotary CVD reactor for reaction, and depositing germanium on matrix germanium at the bottom of the container under the actions of adsorption, decomposition and agglomeration. Through the rotating substrate germanium, the interface disturbance is enhanced, and the chemical reaction rate and the mass transfer coefficient are increased, so that the yield of single-furnace germanium is increased, and the economic benefit is improved; and the gas inlet proportion of high-purity germanium tetrachloride and high-purity hydrogen is reduced, the tail gas separation difficulty is reduced, and the cost is saved. Meanwhile, by adjusting the rotating speed of rotation, the interface u