Semiconductor photoresist compositions and methods of forming patterns using same

Disclosed are a semiconductor photoresist composition including an organometallic compound, an additive represented by Chemical Formula 1, and a solvent, and a method of forming a pattern using the semiconductor photoresist composition. Details of the chemical formula 1 are defined in the specificat...

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Bibliographic Details
Main Authors KIM JI-MIN, PARK KYUNG RYOUNG, IM, SANG KYUN, LEE MIN YOUNG, XU YEYIN, HAN SEUNG
Format Patent
LanguageChinese
English
Published 07.05.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed are a semiconductor photoresist composition including an organometallic compound, an additive represented by Chemical Formula 1, and a solvent, and a method of forming a pattern using the semiconductor photoresist composition. Details of the chemical formula 1 are defined in the specification. 公开一种半导体光刻胶组合物，包含有机金属化合物、由化学式1表示的添加剂以及溶剂，以及一种使用所述半导体光刻胶组合物形成图案的方法。化学式1的细节如说明书中所定义。
Bibliography:Application Number: CN202311349030