Experimental magnetron sputtering source with coil structure

• Main Authors: ZHAO DONGCAI, ZHANG ZE, YANG YING, FENG JINXIAN, ZHENG JUN
• Format: Patent
• Language: Chinese; English
• Published: 03.05.2024
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to the technical field of vacuum coating, in particular to an experimental coil structure magnetron sputtering source which comprises a magnetron cathode target, a coil, a magnet yoke, a water cooling channel and a soft magnetic backboard, and the coil, the magnet yoke and the water cooling channel are all arranged between the magnetron cathode target and the soft magnetic backboard. The water cooling channel is arranged between the coil and the magnetic control cathode target, a magnetic field excited by the coil can act on the surface of the magnetic control cathode target, the number of the magnet yokes is at least two, and the coil is arranged between two adjacent magnet yokes. The magnetic control sputtering source with the coil structure for the experiment solves the problem that the magnetic field direction can be changed while the intensity of the magnetic field is changed by moving the permanent magnet structure back and forth in the conventional magnetic control sputtering sour