System and method for inspection by classification and identification of fault mechanisms in charged particle systems

Apparatus, systems, and methods for providing a beam for classifying and identifying fault mechanisms associated with a sample of a charged particle beam system. In some embodiments, a method may include analyzing a plurality of first voltage contrast images of a sample to identify a plurality of de...

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Bibliographic Details
Main Authors WASNEL, ANDREAS, DILLEN HERMANUS ADRIANUS, NIKOLSKY PAVEL, CORRADI, ANGELO, SUNG YEON-AH, SONG YOUNG-HUN
Format Patent
LanguageChinese
English
Published 30.04.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Apparatus, systems, and methods for providing a beam for classifying and identifying fault mechanisms associated with a sample of a charged particle beam system. In some embodiments, a method may include analyzing a plurality of first voltage contrast images of a sample to identify a plurality of defects; and analyzing the pattern of the subset of the plurality of defects to determine a failure mechanism for the subset of the plurality of defects. 用于提供射束以用于分类和标识与带电粒子射束系统的样品相关联的故障机制的装置、系统和方法。在一些实施例中，一种方法可以包括：分析样品的多个第一电压对比度图像以标识多个缺陷；以及分析多个缺陷的子集的图案，以确定多个缺陷的子集的故障机制。
Bibliography:Application Number: CN20228062103