Adjusting system for improving sedimentation rate ratio of silicon powder to SiC powder

• Main Authors: XU QINLONG, ZHAO KANGJUN, XING QIANGQIANG, HAN YU, LU SHOUPING, GONG GUANCHENG, XU BOWEN, GONG YANG, YUAN HONGFENG
• Format: Patent
• Language: Chinese; English
• Published: 26.04.2024
• Subjects: INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTEDFOR SPECIFIC APPLICATION FIELDS; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; TESTING

The invention provides an adjusting system for increasing the sedimentation rate ratio of silicon powder to SiC powder, and relates to the technical field of control and adjusting.The adjusting system comprises a suspension liquid obtaining module used for conducting stirring treatment on test powder and a target reaction auxiliary agent to obtain test suspension liquid; the test module is used for settling and observing the test suspension to obtain a settling rate ratio of the silicon powder to the SiC powder and taking the settling rate ratio as test data; the analysis module is used for analyzing the double-powder sedimentation influence coefficient and obtaining a target adjustment parameter in combination with a sedimentation correction algorithm; the adjusting module is used for adjusting the required adding amount of the target reaction auxiliary agent by utilizing the target adjusting parameter; and the effectiveness analysis module is used for observing and comparing different sedimentation rate rat