Overlay measurement method
The invention discloses an overlay measurement method in which an overlay mark having a programmed overlay value is provided. The overlay mark is scanned with an electron beam to obtain a voltage contrast image. A defect function that varies according to the overlap value is obtained from the voltag...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
09.04.2024
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses an overlay measurement method in which an overlay mark having a programmed overlay value is provided. The overlay mark is scanned with an electron beam to obtain a voltage contrast image. A defect function that varies according to the overlap value is obtained from the voltage-contrast image data. Self-cross-correlation is performed on the defect function to determine an overlap.
本发明公开一种重叠测量方法,在该重叠测量方法中,提供具有编程的重叠值的重叠标记。用电子束扫描重叠标记以获得电压对比图像。从电压对比图像数据获得根据重叠值而变化的缺陷函数。对缺陷函数执行自互相关以确定重叠。 |
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Bibliography: | Application Number: CN202311280807 |