Preparation method of nano graphite copper material

• Main Authors: ZHANG DONGQIN, CHEN XIANFENG, CHEN BING, FU YINING, FU QINGXUAN, WANG YAN
• Format: Patent
• Language: Chinese; English
• Published: 09.04.2024
• Subjects: CASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MAKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; METALLURGY; PERFORMING OPERATIONS; POWDER METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING; WORKING METALLIC POWDER

The invention discloses a preparation method of a nano graphite copper material. The preparation method comprises the following steps: taking a copper material as a base material and selecting a high-purity graphite target material; the preparation method comprises the following steps: respectively putting a base material into ethanol, acetone and deionized water, cleaning for 20 minutes through ultrasonic waves, drying at the temperature of 60 DEG C, and finally cooling and rolling; the base material is placed in a vacuum cavity, when the vacuum degree in the vacuum cavity reaches 5-3-20-3 pa, a certain amount of Ar gas is introduced firstly, the pressure in the vacuum cavity is made to be 1-2 Pa, under the conditions that the bias amplitude is 400-600 V and the duty ratio is 30-60%, Ar plasma is used for sputtering the surface of the base material for 10-30 min, and therefore an oxide layer on the surface is removed; a graphite target material is used as a carbon source, a pair of twin alternating current p