MEASUREMENT METHOD AND DEVICE

A method for measuring a target underneath at least one layer on a substrate is disclosed. The method comprises: exciting the at least one layer with pumping radiation comprising at least one pumping wavelength so as to produce within the at least one layer acoustic waves reflected from the target,...

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Bibliographic Details
Main Authors SETIJA IRWAN D, PLANKEN PAULUS ENS MARIA, DE HAAN GERARD, VAN DEN HOVEN TIMOTHY J, EDWARD STEPHEN
Format Patent
LanguageChinese
English
Published 02.04.2024
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Summary:A method for measuring a target underneath at least one layer on a substrate is disclosed. The method comprises: exciting the at least one layer with pumping radiation comprising at least one pumping wavelength so as to produce within the at least one layer acoustic waves reflected from the target, thereby producing an acoustic replica of the target at the surface of the substrate; and irradiating the acoustic replica with probe radiation comprising at least one probe wavelength, and capturing the resulting scattered probe radiation scattered from the acoustic replica. One or both of the excitation step and the irradiation step include generating a surface plasmon polariton (SPP) derived from the target on a residual topography of the at least one layer. 披露了一种用于测量衬底上的位于至少一个层下方的目标的方法。所述方法包括:利用包括至少一种泵浦波长的泵浦辐射激发所述至少一个层,以便在所述至少一个层内产生从所述目标反射的声波,由此在所述衬底的表面处产生所述目标的声学复制品;以及利用包括至少一种探测波长的探测辐射照射所述声学复制品,并且捕获从所述声学复制品散射的得到的经散射的探测辐射。所述激发步骤和所述照射步骤中的一个或两个步骤包括:在所述至少一个层的残余形貌上产生从所述目标得到的表面等离子体激元(SPP)。
Bibliography:Application Number: CN202280056334