Heat treatment device, working method thereof and optical spin coater equipment

• Main Authors: LEE JONG-KEUN, OH JIN-TAEK
• Format: Patent
• Language: Chinese; English
• Published: 29.03.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Embodiments of the present invention provide a heat treatment apparatus that minimizes deformation of a substrate using a low vacuum pressure, thereby uniformly heating the entire area of the substrate, a method of operating the same, and an optical spin coater apparatus. The heat treatment apparatus for performing heat treatment on a substrate according to the present invention comprises: a base plate provided in a disc shape; a support pin formed on the upper surface of the base plate; a vacuum hole formed through the base plate; and a protruding member formed on the upper surface of the base plate to be lower than the height of the support pin. 本发明的实施例提供一种使用低真空压力使基板的变形最小化，从而均匀地加热到基板的整个区域的热处理装置、其工作方法以及光旋涂器设备。根据本发明的针对基板执行热处理的热处理装置包括：基底板，以圆盘形状提供；支承销，在所述基底板的上面形成；真空孔，贯通所述基底板形成；以及凸出部件，在所述基底板的上面低于所述支承销的高度形成。