Silicon-aluminum target material for vacuum coating and preparation method thereof

• Main Author: HOU MINBO
• Format: Patent
• Language: Chinese; English
• Published: 26.03.2024
• Subjects: ARTIFICIAL STONE; CEMENTS; CERAMICS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS; CONCRETE; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; LIME, MAGNESIA; METALLURGY; REFRACTORIES; SLAG; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TREATMENT OF NATURAL STONE

The invention provides a silicon-aluminum target material for vacuum coating and a preparation method thereof, and relates to the technical field of target material preparation. The preparation method of the silicon-aluminum target material for vacuum coating comprises the following steps: S1, uniformly mixing aluminum oxide and silicon dioxide, carrying out ball milling treatment, and drying to obtain a silicon-aluminum mixture; s2, the silicon-aluminum mixture is put into a mold to be pressed and formed, and a silicon-aluminum target blank is obtained; and S3, sintering and cooling the silicon-aluminum target blank to obtain the silicon-aluminum target for vacuum coating. The silicon-aluminum target material for vacuum coating provided by the invention is high in density, high in uniformity and small in planeness tolerance. 本发明提供一种真空镀膜用硅铝靶材及其制备方法，涉及靶材制备技术领域。一种真空镀膜用硅铝靶材的制备方法，包括以下步骤：S1、将氧化铝和二氧化硅混合均匀、球磨处理、干燥，得到硅铝混合物；S2、将硅铝混合物放入模具中压制处理成型，得到硅铝靶材胚；S3、将硅铝靶材胚烧结、冷却，得到一种真空镀膜用硅铝靶材。本发明提供的真空镀膜用硅铝靶材密度高、均匀度高、平面度公差小。