Micro-fabricated device for controlling trapped ions and method of manufacturing device by micro-fabrication

A device (100) for controlling trapped ions (180) comprises a first semiconductor substrate (120) comprising a semiconductor and/or dielectric material. A first microfabricated electrode structure (125) is disposed at a major side of the first substrate (120). The device (100) further comprises a se...

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Main Authors COLUMBE YANNICK, DE CAROLI, CLAUDIO, HOM JAMES, STOCK GREG, VALENTINI, MAURO, SKORIDIS, SVETLANA, OCHTER STEFFEN, ROESSLER CHRISTOPH, HORZ PETER
Format Patent
LanguageChinese
English
Published 15.03.2024
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Summary:A device (100) for controlling trapped ions (180) comprises a first semiconductor substrate (120) comprising a semiconductor and/or dielectric material. A first microfabricated electrode structure (125) is disposed at a major side of the first substrate (120). The device (100) further comprises a second substrate (140) comprising a semiconductor and/or dielectric material. A second microfabricated electrode structure (145) is disposed at a major side of the second substrate (140) opposite the major side of the first substrate (120). A plurality of spacer members (160) is disposed between the first substrate (120) and the second substrate (140). At least one ion trap is configured to trap ions (180) in a space between the first substrate (120) and the second substrate (140). The first microfabricated electrode structure (125) and the second microfabricated electrode structure (145) include electrodes of the ion trap. A multilayer metal interconnect (135) is formed on the first substrate (120) and electrically
Bibliography:Application Number: CN20228049615