Regeneration comprehensive utilization method and system for rough polishing waste liquid in monocrystalline silicon texturing process and application
The invention relates to the field of waste liquid treatment in the photovoltaic solar industry, and discloses a regeneration and comprehensive utilization method and system for rough polishing waste liquid in a monocrystalline silicon texturing process and application. The method comprises the foll...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
12.03.2024
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to the field of waste liquid treatment in the photovoltaic solar industry, and discloses a regeneration and comprehensive utilization method and system for rough polishing waste liquid in a monocrystalline silicon texturing process and application. The method comprises the following steps: conveying raw water subjected to oil separation treatment on the rough polishing waste liquid to an alkali replacement reaction device, and reacting silicate in the raw water with lime milk to convert into alkali metal hydroxide and calcium silicate precipitate; filtering the aged reaction liquid to separate the calcium silicate precipitate from the solution, heating the filtrate to evaporate water, and naturally cooling and crystallizing to obtain alkali metal hydroxide crystals; filtering the alkali metal hydroxide crystal to obtain a high-purity alkali metal hydroxide product; and returning the filtrate to the alkali replacement reaction device for circular treatment. According to the method, throug |
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Bibliography: | Application Number: CN202311520124 |