Systems and methods for lithographic tools with increased tolerances

• Main Authors: VAN DE VEN EDUARD ANTONIUS, DE JAGER PIETER WILLEM HENDRIK, WINTERS JUSTIN, VAN WERT, EDUARD, J, VAN DER LANS, MICHIEL, J
• Format: Patent
• Language: Chinese; English
• Published: 08.03.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A method for a lithographic tool includes scanning a substrate relative to a first microlens array (MLA) and a second MLA, each of the first microlens array (MLA) and the second MLA having a plurality of rows of lenslets. The first MLA has a functional lenslet and an additional lenslet, and the scanning includes passing light to the substrate via the lenslets of the first MLA and the second MLA. The delivering includes delivering light via the functional lenslets to form a pattern on the substrate, the pattern having a gap caused by positional or rotational misalignment between the functional lenslets of the first MLA and the second MLA. The delivering also includes delivering light via the additional lenslets to fill the gaps in the pattern. 一种用于光刻工具的方法，包括：相对于第一微透镜阵列(MLA)和第二MLA来扫描衬底，第一微透镜阵列(MLA)和第二MLA中的每个具有多行小透镜。所述第一MLA具有功能性小透镜和额外的小透镜，并且所述扫描包括经由所述第一MLA和所述第二MLA的所述小透镜将光传递至所述衬底。所述传递包括：经由所述功能性小透镜传递光以在所述衬底上形成图案，所述图案具有由所述第一MLA与所述第二MLA的所述功能性小透镜之间的位置错位或旋转错位引起的间隙。所述传递也包括经由所述额外的小透镜传递光以填充所述图案中的所述间隙。