Semiconductor device
A semiconductor device includes: a substrate including a cell region and a peripheral region and a boundary region therebetween; a lower insulating layer on the cell region and extending onto the boundary region and the peripheral region; a data storage pattern on the lower insulating layer on the c...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
08.03.2024
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Subjects | |
Online Access | Get full text |
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Summary: | A semiconductor device includes: a substrate including a cell region and a peripheral region and a boundary region therebetween; a lower insulating layer on the cell region and extending onto the boundary region and the peripheral region; a data storage pattern on the lower insulating layer on the cell region; a cell insulating layer on the lower insulating layer on the cell region and on the data storage pattern; a first upper insulating layer on the unit insulating layer; a peripheral conductive line on the lower insulating layer on the peripheral region; and a peripheral insulating layer on the lower insulating layer on the peripheral region and on the peripheral conductive line. The peripheral insulating layer extends onto the lower insulating layer on the boundary region to contact a side surface of the unit insulating layer and a side surface of the first upper insulating layer. The peripheral insulating layer includes a different material than the unit insulating layer.
一种半导体器件包括:基板,包括单元区和外围区以及在它们之间的边界 |
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Bibliography: | Application Number: CN202311075199 |