Lithographic apparatus, locking device and method

A lithographic apparatus comprises an illumination system for illuminating a pattern of a patterning device, a projection system for projecting an image of the pattern onto a substrate, a movable stage for supporting the patterning device or the substrate, a slotted object, and a locking device (700...

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Bibliographic Details
Main Authors DUNET ALAIN, BURBANK DANIEL NATHAN
Format Patent
LanguageChinese
English
Published 13.02.2024
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A lithographic apparatus comprises an illumination system for illuminating a pattern of a patterning device, a projection system for projecting an image of the pattern onto a substrate, a movable stage for supporting the patterning device or the substrate, a slotted object, and a locking device (700) for blocking movement of the movable stage. The locking device includes an actuator (702) and a wheel device (704) including a ring member (708) coupled to the actuator. The actuator rotates the wheel arrangement about an axis of rotation (706). The ring member has a width (710) defined parallel to the axis of rotation. The width is changeable relative to the azimuth direction of the wheel arrangement. The ring member engages the slot of the slotted object. The rotation adjusts the width of the ring member within the slot such that relative movement between the device and the slotted object is prevented. 一种光刻设备，包括用于照射图案形成装置的图案的照射系统、用于将图案的图像投影到衬底上的投影系统、用于支撑图案形成装置或衬底的可移动平台、开有槽的物体、以及用于阻止可移动平台的运动的锁定装置(700)。锁定装置包括致动器(
Bibliography:Application Number: CN202280045308