High-voltage plasma power supply with wide dynamic response

The invention discloses a high-voltage plasma power supply with wide dynamic response, and belongs to the field of high-voltage plasma, and the high-voltage plasma power supply comprises a full-bridge rectification circuit, a variable power circuit, a high-voltage booster circuit, an output end feed...

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Bibliographic Details
Main Authors LEI HONG, TAO ZHONGYUAN
Format Patent
LanguageChinese
English
Published 09.02.2024
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Summary:The invention discloses a high-voltage plasma power supply with wide dynamic response, and belongs to the field of high-voltage plasma, and the high-voltage plasma power supply comprises a full-bridge rectification circuit, a variable power circuit, a high-voltage booster circuit, an output end feedback circuit, an output end protection circuit and an MCU processor. Sensing data is sent to the MCU processor through the output end feedback circuit, the MCU processor calculates to obtain a current output power parameter, a control parameter is sent to the variable power circuit to be executed, power conversion from low voltage to high voltage is executed through the high voltage booster circuit, and then plasma output parameters are actively controlled. And the wide dynamic response plasma power supply output is realized. 本发明公开了一种宽动态响应的高压等离子电源,属于高压等离子领域,高压等离子电源包括全桥整流电路、变功率电路、高压升压电路、输出端反馈电路、输出端保护电路及MCU处理器,通过对等离子电源的输出端进行实时感知,感知数据经由输出端反馈电路送往MCU处理器,经由MCU处理器计算得到当前输出的功率参数,并将控制参数送往变功率电路进行执行,并通过高压升压电路执行低压转高压的电力变换,进而主动控
Bibliography:Application Number: CN202311431302