Defect detection based on tunable wavelength laser source induced second harmonics
The invention provides a defect detection scheme based on second harmonics induced by a tunable wavelength laser source, and solves the problem of limitation of a detection range caused by different detection requirements of materials with different forbidden bandwidths and the problem of realizing...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
09.02.2024
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides a defect detection scheme based on second harmonics induced by a tunable wavelength laser source, and solves the problem of limitation of a detection range caused by different detection requirements of materials with different forbidden bandwidths and the problem of realizing the scheme. According to the invention, firstly, the application range is widened. The dual-light-source system not only can accurately measure the energy band structure of the material, but also can adjust the wavelength of exciting light in a targeted manner, so that the range of applicable materials is wider. Secondly, measurement parameters are increased. By means of the double-light-source structure, after exciting light is turned off, electron recombination can still be detected through detection light, the recombination process can be observed, and therefore the service life and the diffusion length of carriers can be analyzed. And finally, by ensuring that the energy distribution of the area detected by the |
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Bibliography: | Application Number: CN202310985909 |