Top electrode mechanism, plasma processing device, control method and control device

The invention relates to an upper electrode mechanism, a plasma processing device, a control method and a control device. The upper electrode mechanism comprises a back assembly, an upper electrode and a lifting mechanism. The upper electrode comprises a first electrode, and the first electrode is a...

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Bibliographic Details
Main Authors ZHENG FENCHENG, HUANG WULIN
Format Patent
LanguageChinese
English
Published 23.01.2024
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:The invention relates to an upper electrode mechanism, a plasma processing device, a control method and a control device. The upper electrode mechanism comprises a back assembly, an upper electrode and a lifting mechanism. The upper electrode comprises a first electrode, and the first electrode is attached to the back assembly. The lifting mechanism is connected to the back assembly and connected with the first electrode, and the lifting mechanism is used for driving the first electrode to do lifting motion so that the first electrode can be tightly attached to the back assembly. According to the upper electrode mechanism, the first electrode can be driven to do lifting motion through the lifting mechanism, so that the first electrode is tightly attached to the back assembly, the parallelism of the first electrode and the back assembly can be guaranteed, and therefore the phenomenon that the first electrode is not tightly attached to the back assembly due to the principle of thermal expansion and cold contrac
Bibliography:Application Number: CN202210822291