Leveling device and photoetching machine

• Main Authors: XIE YIREN, QI NENG
• Format: Patent
• Language: Chinese; English
• Published: 09.01.2024
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention relates to the technical field of photoetching machines, and discloses a leveling device and a photoetching machine. The leveling device comprises a suction cup assembly, a mask table, a vertical movement table and at least three leveling assemblies. The adjusting balls of the at least three leveling assemblies are not on the same straight line; the vertical driving assembly is in driving connection with the base, and the vertical driving assembly is used for driving the base to ascend and descend so as to drive the base to ascend and descend, so that the base abuts against the lower end point of the adjusting ball, and the mask plate abuts against the upper end point of the adjusting ball; the displacement sensor is arranged between the base and the carrying table component, and the displacement sensor is used for detecting the displacement of the carrying table component relative to the base; the control module is used for receiving a detection result of the detection assembly and controlling